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Determination of the diffraction intensity at slit and double slit systems
Principle: Slit and double slit systems are illuminated with laser light. The corresponding diffraction patterns are measured by means of a photodiode which can be shifted, as a function of location and intensity.
Tasks:
1. Determination of the intensity distribution of the diffraction patterns due to two slits of different widths. The corresponding width of the slit is determined by means of the relative positions of intensity values of the extremes. Furthermore, intensity relations of the peaks are evaluated.
2. Determination of location and intensity of the extreme values of the diffraction patterns due to two double slits with the same widths, but different distances between the slits. Widths of slits and distances between the slits must be determined as well as the intensity relations of the peaks.
| Artikel-Nr. | Artikelbezeichnung |
|---|---|
| P2230500 | Determination of the diffraction intensity at slit and double slit systems |
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